溅射系统
Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.
利用低频反应磁控溅射制备五氧化二铌光学薄膜.
Development of Multi target 2 chamber Sputtering System
多靶双室磁控溅射机的研制
Bonding of Target Material and Backing Plate for 9900 Sputtering System
9900型靶材与靶托的连接技术
Study on Influence of Target Powers on Properties of Diamond-Like Carbon Films Deposited by Mid-Frequency Magnetron Sputtering System
中频磁控溅射制备类金刚石薄膜的功率因素研究
Described is an equipment consisting of several systems as follows: an ion system, having a sputtering ion source and an asymmetric three electrode acceleration tube, operated at 50 keV with a beam current up to 4 mA ( for N+);
本设备由以下系统组成:注入系统,有溅射离子源及不对称三电极加速管,能量50keV,流强4mA(N~+);
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